Area-Selective Etching of Poly(methyl methacrylate) Films by
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Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching
Fluorine-containing polymeric inhibitor for highly selective and durable area-selective atomic layer deposition - ScienceDirect
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Electron beam induced removal of PMMA layer used for graphene transfer
Rapid Fabrication of Poly(methyl methacrylate) Devices for Lab-on-a-Chip Applications Using Acetic Acid and UV Treatment
Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers
Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition
A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films
Polymer masks for structured surface and plasma etching - ScienceDirect
Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition
Fluorine-containing polymeric inhibitor for highly selective and durable area-selective atomic layer deposition - ScienceDirect
Left) SIS lithography using block copolymer. a) Self-assembled
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